摘要
对传统HFCVD金刚石膜沉积设备进行小型化改进,分析了传统沉积设备在真空系统和衬底机构结构上的不足之处;介绍了小型化CVD金刚石膜沉积设备的系统构成;详细描述了该小型化设备的真空系统和衬底摆动机构。该系统具有均匀的表面温度场和很高的运行稳定性,可以用于纳米金刚石薄膜和金刚石厚膜的沉积,制备的纳米金刚石薄膜晶粒大小基本上都在200 nm以下,纳米硬度为（450-700）GPa;沉积的金刚石厚膜直径达93 mm,晶粒完整均匀。
In this paper,the structural miniaturization of the traditional HFCVD diamond film deposition equipment is improved.The structural shortages of vacuum system together with substrate platform organization of traditional deposition equipment is analyzed.System structure of miniature CVD diamond film deposition equipment is presented.The improved miniature vacuum system and the substrate platform organization is described in detail.Testing results show that this system has a uniform substrate temperature field and a high operation stability,and that it could be used to deposit both nano-diamond film and thick diamond film.The deposited nano-diamond film is less than 200nm and its nano-hardness is（450-700）GPa,crystal size of the diameter of the thick diamond film is 93mm,both film crystal is uniform and integral.
出处
《机械制造与自动化》
2010年第2期35-38,79,共5页
Machine Building & Automation
基金
江苏省自然科学基金(No.BK2007193
No.BK2008382)
南京航空航天大学创新基金(No.20080109107261)
中国博士后科学基金(No.20090461144)
江苏省博士后科学基金(No.0802025B)资助
