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Tl在Si(111)面吸附特性理论研究 被引量:1

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出处 《河南师范大学学报(自然科学版)》 CAS CSCD 北大核心 2010年第2期186-186,共1页 Journal of Henan Normal University(Natural Science Edition)
基金 国家自然科学基金项目(60476047) 河南省高校科技创新人才支持计划(2008HALTST030)
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参考文献3

  • 1Visikovskiy A,Mizuno S,Tochihara H.Reversible electromigration of thallium adatoms on the Si (111) surface[J].Surf Sci,2006,600(15):189-193.
  • 2Dai X Q,Ju W W,Wang G T,Xie M H.First-principles study of indium on silicon(1 0 0)structure,defects and interdiffusion[J].Surf Sci,2004,572(1):77-83.
  • 3Sakamoto K,Eriksson P E J,Ueno N,et.al.Photoemission study of a thallium induced Si(111)-(√3×√3) surface[J].Surf Sci,2007,601(22):5258-5261.

同被引文献7

  • 1Novoselov K, Geim A, Morozov S et al. Electric field effect in atomically thin carbon films[J]. Science,2004,306:666.
  • 2Barone V, Peralta J, Uddin J, et al. Screened exchange hybrid density-functional study of the work function of pristine and doped single- walled carbon nanotubes[J]. The Journal of chemical physics, 2006,124:024709.
  • 3Latil S, Roche S, Mayou D, et al. Mesoscopic transport in chemically doped carbon nanotubes[J]. Physical review letters, 2004,92 (25) : 256805.
  • 4Aktiirk E, AtacaC, Ciraci S. Effects of silicon and germanium adsorbed on graphene[J]. Applied Physics Letters,2010,96:123112.
  • 5Kresse G, Hafner J. Norm-conserving and ultrasoft pseudopotentials for first-row and transition elements. Journal of Physics: Condensed Matter,1994(6) :8245.
  • 6Denis P. Band Gap Opening of Monolayer and Bilayer Graphene Doped with Aluminium, Silicon, Phosphorus, and Sulfur[J]. Chemical Physics Letters.
  • 7Denis P, Faccio R, Mombru A. Is It Possible to Dope Single-Walled Carbon Nanotubes and Graphene with Sulfur[J]. Chera Phys Chem, 2009,10 (4), 715-722.

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