摘要
对低温等离子体技术降解全氟化合物的研究现状、新型技术、成果、存在的问题以及发展方向做了全面综述。着重总结了微波等离子体技术、水等离子体技术、填充床等离子体技术等。简要阐明了低温等离子体技术对全氟化合物的去除机理,以及微波等离子体技术和水等离子体技术对CF4的降解机理。最后总结低温等离子体技术对全氟化合物降解的发展前景。
Present status, new technologies, achievements and development about decomposition of porfluorochemicals by non-thermal plasma were reviewed. Such technologies as microwave plasma, water plasma and packed-bed plasma were discussed. The mechanisms of perfuorochemicals were investigated, such as the mechanisms of CF4 decomposition by microwave plasma and water plasma. Finally, the prospects for perfluorochemicals by plasma were concluded.
出处
《环境科技》
2010年第2期59-63,共5页
Environmental Science and Technology
基金
水处理与水环境修复教育部工程研究中心开放基金资助项目(WTWER0709)
关键词
全氟化合物
低温等离子体
机理
Perfluorochemicals
Non-thermal plasma（NTP）
Mechanism
