锆钒合金非晶膜的制备及性能研究

Studies of preparation and propeties on amorphous zirconium vanadium alloy films

采用磁控溅射法制备出V/Zr比为2:1的非晶态锆钒合金膜,系统研究了合金膜的物相、表面成分、生长形貌和动态力学性能。研究结果表明,在533～773K的沉积温度区间内,合金膜呈现非晶态,表面存在约26nm厚的氧化层,其组成与膜基体显著不同;合金膜在钼基片上以球形岛状模式生长;膜的动态硬度DHT115和弹性模量Eit/(1-υ2)随沉积温度的升高在583K处出现极大值,分别达到436.8GPa和1.13E+5N/mm2。

Amorphous zirconium vanadium alloy films with V/Zr=2 were prepared by magnetron sputtering.The phase,surface composition,growth morphology and dynamic mechanical properties of the films were investigated systematically.The results showed that zirconium vanadium alloy films deposited at between 533 and 773K consist of amorphous phase.There was a layer of oxidation about 26nm in the surface of the films,and its composition is remarkable different of the body.The growth films on Mo substrate deposited in global island model.With the depositing temperature going up,the dynamic hardness （DHT115） and elastic module Eit/（1-υ^2） of the films had maximums at 583K,where the value of DHT115 was 436.8GPa and the value of Eit/（1-υ^2） was 1.13E＋5N/mm^2