实时测量器件中光学薄膜厚度的新方法研究

In-situ Measurements of the Optical Film Thickness in Vacuum Devices Fabrications

从薄膜光学理论出发，阐述了利用光学反射比实时测量特种器件中光学薄膜厚度的原理，介绍了测试仪器，分析了测试结果。在已知基底的折射率、光学薄膜的折射率、消光系数及入射光波长的情况下，可计算出光学薄膜的反射比随厚度变化的理论曲线，实验曲线与理论曲线相比较，可实时获得薄膜的厚度信息，这对控制薄膜工艺很有益处。

A novel technique was proposed to evaluate the thickness of optical films in-situ by measuring their optical reflectance coefficients. When the major physical quantities including the refrectivity of the substrate,the refrectivity and the absorption coefficient of the film and the wavelength of the incident light are known, the dependence of the optical film reflectance on the variations in the film thickness can be theoretically calculated and plotted in the ρ(d) curves. The thickness of the growing film at any stage of interest can be obtained in-situ by comparing its experimental ρ(d) curve with the theoretical ρ(d) curve. The thickness measurements is of much importance in optimization of the film growth process.