用于大面积材料表面改性研究的微波等离子体源

The Microwave Plasma Source Used in Large Area Material Modification

介绍了环形狭缝波导天线等离子体源的原理和结构。采用微波单探针测量了无等离子体情况下环形波导狭缝天线内的电场分布，利用Langmuir双探针测量了该源的氩等离子体的特性，结果表明在微波功率为200～600W，运行气压为40～600Pa范围内，电子温度可达0.5～3eV，离子密度最高达6×1010cm-3在气压为100Pa，等离子体的直径为16cm范围内，其不均匀性不超过25％。

The annular waveguide plasma source with slot-antennas has been successfully developed. In this paper,its operating principle and its structure were discussed. The electric field distribution inside the slot-antennas without any plasma was measured using a microwave single prohe, and the characteristics of argon plasma generated by the source were also studied with a double-Langmuir-probe. The results showed that the electron temperature can be 0.5 to 3 eV;and the maximum ion density may reach 6 x 1010 cm -3, for a microwave power ranging from 200 to 600 W at a pressure from 40 ~ 600 Pa. The radial varations in the ion density were found to be less than 25%, within the plasma of 16 cm in diameter, in a pressure of 100 Pa.