期刊文献+

用于软X射线显微术的氮化硅窗口的研制 被引量:2

Fabrication of Si_3N_4 Windows for Soft X-Ray Microscopy
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摘要 氮化硅膜具有对软X射线吸收较小、成膜光滑、强度大和致密性好等优点,因而常选作为窗口材料。本文主要介绍了用于软X射线显微术的氮化硅窗口的制备工艺,给出在国家同步辐射实验室软X射线显微术实验站使用的实验结果。 Silicon nitride film is a good window material for soft X-ray microscopy because of its many favorable properties ,such as low X-ray absorption coefficient ,smooth film surface and fairly dense with high mechanical strength .In this paper, the fabrication of silicon nitride window for soft X-ray microscopy and its field application in National Syn-chrotron Radiation Laboratory of USTC were briefly discussed.
出处 《真空科学与技术》 CSCD 北大核心 1998年第2期151-154,共4页 Vacuum Science and Technology
基金 国家同步辐射实验室开放课题
关键词 软X射线显微术 同步辐射 氮化硅窗口 薄膜 Soft X-ray microscopy, Synchrotron radiation,Si_3N_4 window
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参考文献4

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同被引文献13

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  • 9TORMA P T,SIPILA H J,MATTILA M,et al.Ultra-thin silicon nitride X-ray windows[J].IEEE Trans Nucl Sci,2013,60:1311-1314.
  • 10蒋诗平,张新夷,阚娅,付绍军,徐向东,单晓斌,陈建文,徐至展,陈敏.软X射线显微术活体材料成像的实验研究[J].光学学报,1997,17(7):959-959. 被引量:2

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