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利用特殊脉冲电源电沉积制备CuInSe_2薄膜 被引量:1

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摘要 采用钟形波调制的方波脉冲电源以恒电流模式在导电玻璃基底(ITO)上电沉积制得了CuInSe2薄膜,用扫描电子显微镜(SEM)、X射线能谱仪(EDS)和X射线衍射仪(XRD)对在不同频率下制备的CuInSe2薄膜的表面形貌、成分组成和组织结构进行了研究.结果发现,在合适频率下制得的薄膜表面平整,颗粒均匀致密,成分接近理想化学计量比,具有单一的黄铜矿结构.在氮气气氛下退火处理后,薄膜结晶性能有较大提高.同时,通过薄膜截面分析发现,在脉冲恒电流模式下沉积速率较快,膜层与基底结合紧密,对工业化生产具有重要意义.
出处 《科学通报》 EI CAS CSCD 北大核心 2010年第12期1094-1098,共5页 Chinese Science Bulletin
基金 国家自然科学基金(批准号:90306010 10874040) 高等学校科技创新工程重大项目培育资金(编号:708062)资助项目
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二级参考文献33

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