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La_(0.5)Sr_(0.5)CoO_3/Pb(Zr_(0.4)Ti_(0.6))O_3/La_(0.5)Sr_(0.5)CoO_3铁电电容器的结构和性能研究

Structure and Properties of La_(0.5)Sr_(0.5)CoO_3/Pb(Zr_(0.4)Ti_(0.6))O_3/La_(0.5)Sr_(0.5)CoO_3 Ferroelectric Capacitor
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摘要 采用磁控溅射法和脉冲激光沉积法,在SrTiO3(001)衬底上制备了La0.5Sr0.5CoO3(70 nm)/Pb(Zr0.4Ti0.6)O3(70 nm)/La0.5Sr0.5CoO3(70 nm)(LSCO/PZT/LSCO)铁电电容器异质结。X射线衍射结果表明:LSCO和PZT薄膜均为外延结构。在5 V的外加电压下,LSCO/PZT/LSCO电容器具有较低的矫顽电压(0.49 V),较高的剩余极化强度(41.7μC/cm2)和较低的漏电流密度(1.97×10-5A/cm2),LSCO/PZT/LSCO电容器的最大介电常数为1073。漏电流的分析表明:当外加电压小于0.6 V时,电容器满足欧姆导电机制;当外加电压大于0.6 V时,符合空间电荷限制电流(SCLC)导电机制。 La0.5Sr0.5CoO3(70 nm)/Pb(Zr0.4Ti0.6)O3(70 nm)/La0.5Sr0.5CoO3(70 nm)(LSCO/PZT/LSCO) capacitor was fabricated on SrTiO3(001) substrate by RF magnetron sputtering and pulsed laser deposition(PLD) method.X-ray diffraction(XRD) shows that both LSCO and PZT thin films are epitaxial structures.It is found that the coercive voltage,remnant polarization,leakage current density and the maximum dielectric constant of LSCO/PZT/LSCO capacitor measured at the voltage of 5 V are 0.49 V,41.7 μC/cm^2,1.97×10^-5 A/cm^2,1073,respectively.Leakage current density of the LSCO/PZT/LSCO capacitor is further investigated,which meets ohmic behavior at lower voltage(〈0.6 V) and agrees well with the space-charge-limited current(SCLC) theory at higher voltage(〉0.6 V).
出处 《人工晶体学报》 EI CAS CSCD 北大核心 2010年第2期350-354,364,共6页 Journal of Synthetic Crystals
基金 国家自然科学基金(No.60876055) 河北省自然科学基金项目(E2008000620 E2009000207) 教育部科学技术研究重点项目(No.207013) 河北省应用基础研究计划重点基础研究项目(No.08965124D)
关键词 铁电电容器 PZT 外延薄膜 导电机制 ferroelectric capacitor PZT epitaxial film conduction mechanism
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参考文献17

  • 1Liu B T,Maki K,Aggarwal S,et al.Low-temperature Integration of Lead-based Ferroelectric Capacitors on Si with Diffusion Barrier Layer[J].Appl.Phys.Lett.,2002,80(19):3599-3601.
  • 2Wu D,Kunishima I,Roberts S,et al.Spatial Variations in Local Switching Parameters of Ferroelectric Random Access Memory Capacitors[J].Appl.Phy.s Lett.,2009,95(9):092901.
  • 3Pintilie L,Lisca M,Alexe M.Polarization Reversal and Capacitance-voltage Characteristic of Epitaxial Pb(Zr,Ti)O3 Layers[J].Appl.Phys.Lett.,2005,86(19):192902.
  • 4Kim G H,Lee H J,Jiang A Q,et al.An Analysis of Imprinted Hysteresis Loops for a Ferroelectric Pb(Zr,Ti)O3 Thin Film Capacitor Using the Switching Transient Current Measurements[J].J.Appl.Phys.,2009,105(4):04410.
  • 5Yun K Y,Ricinschi D,Kanashima T,et al.Enhancement of Electrical Properties in Polycrystalline BiFeO3 Thin Films[J].Appl.Phys.Lett.,2006,89(19):192902.
  • 6Feigl L,Pippel E,Pintilie L,et al.Chromium Doping of Epitaxial PbZr0.2Ti0.8O3 Thin Films[J].J.Appl.Phys.,2009,105(12):126103.
  • 7Maroni V A,Li Y,Feldmann D M,et al.Correlation between Cation Disorder and Flux Pinning in the YBa2Cu3O7 Coated Conductor[J].J.Appl.Phys.,2007,102(11):113909.
  • 8Kawae T,Terauchi Y,Tsuda H,et al.Improved Leakage and Ferroelectric Properties of Mn and Ti Codoped BiFeO3 Thin Films[J].Appl.Phys.Lett.,2009,94(11):112904.
  • 9Lee H N,Nakhmanson S M,Chisholm M F,et al.Suppressed Dependence of Polarization on Epitaxial Strain in Highly Polar Ferroelectrics[J].Phys.Rev.Lett.,2007,98(21):217602.
  • 10Pintilie L,Dragoi C,Chu Y H,et al.Orientation-dependent Potential Barriers in Case of Epitaxial Pt-BiFeO3-SrRuO3 Capacitors[J].Appl.Phys.Lett.,2009,94(23):232902.

二级参考文献10

  • 1Manoj K Y,Manoranjan G,Ranjit B,et al.Band-gap Variation in Mg-and Cd-doped ZnO Nanostructures and Molecular Clusters[].Physical Review B Condensed Matter and Materials Physics.2007
  • 2Litty I,Nampoori V P N,Radhakrishnan P,et al.Size-dependent Enhancement of Nonlinear Optical Properties in Nanocolloids of ZnO[].Journal of Applied Physiology.2008
  • 3Schulze K,Maennig B,Leo K,et al.Organic Solar Cells on Indium Tin Oxide and Aluminum Doped Zinc Oxide Anodes[].Applied Physics Letters.2007
  • 4Suvorova N A,Usov I O,Stan L,et al.Structural and Optical Properties of ZnO Thin Films by RF Magnetron Sputtering with Rapid ThermalAnnealing[].Journal of Applied Physiology.2008
  • 5Liu HF,Chua S J,Hu G X.et al.Effects of Substrate on the Structure and Orientation of ZnO Thin FilmGrown by rf-magnetron Sputtering[].Journal of Applied Physiology.2007
  • 6Liu C,Chang S H,Noh T W,et al.Initial Growth Behavior and Resulting Microstructural Properties of Heteroepitaxial ZnO Thin Films onSapphire(0001)Substrates[].Applied Physics Letters.2007
  • 7Shiao W Y,Chi C Y,Chin S C,et al.Comparison of Nanostructure Characteristics of ZnO Grown on GaN and Sapphire[].Journal of Applied Physiology.2006
  • 8Wei X H,Li YR,Zhu J,et al.Epitaxial Properties of ZnO Thin Films on SrTiO3Substrate Grown by Laser Molecular BeamEpitaxial[].Applied Physics Letters.2007
  • 9Srinivasan G,Kumar J.Optical and Structural Characterisation of Zinc Oxide Thin Films Prepared by Sol-gel Process[].Crystal Research and Technology.2005
  • 10Sang I P,Tae S C,Seok J D,et al.Structural Evolution of ZnO/sapphire(001)Heteroepitaxy Studied by Real Time Synchrotron X-rayScattering[].ApplPphysLett.2000

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