摘要
采用电沉积方法在氧化铟锡(ITO)导电玻璃上沉积了ZnS薄膜,利用X射线衍射仪(XRD)、紫外-可见光(UV-VIS)分光光度计对薄膜的微结构和光学性能进行了表征,研究了热处理条件对薄膜的相组成和光学性能的影响。结果表明:电沉积制备的ZnS薄膜呈非晶态,并且含有单质Zn。硫化热处理可以改善薄膜的结晶状况,减少杂质Zn的含量。硫气氛中450℃热处理4 h之后,薄膜中单质Zn全部反应生产ZnS,得到了纯的ZnS薄膜。没有经过热处理的薄膜,其可见光透射率在70%左右,热处理后薄膜样品的透射率降低,在硫气氛中热处理4 h的样品,其可见光透射率最低,为50%左右,热处理条件对薄膜样品的禁带宽度值基本没有影响。
ZnS thin films were deposited on ITO glass by electrodeposition,the microstructure and optical properties of the ZnS thin films were characterized by XRD and UV-Vis test.The results show that the deposited thin films are amorphous and metal zinc exists in the ZnS films.Sulfuration could improve the crystal phase composition and decrease the amount of metal Zn.Pure ZnS thin films were obtained by annealed at 450 ℃ for 4 h in sulfur atmosphere because all metal Zn react with S to form ZnS.The transmittances of the thin films in the range of visible light are about 70% before annealing,the optical transmittances decrease after annealing.The optical transmittances of the thin films are lower about 50% after annealing for 4 h,the heat treatment conditions has little influence on the bandgap of ZnS thin films.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2010年第2期392-395,共4页
Journal of Synthetic Crystals
基金
武汉市科技攻关资助项目(No.20061002037)
关键词
ZNS薄膜
电沉积
热处理
光学性能
ZnS thin films
electrodeposition
annealing
optical properties