摘要
用光助,低压MOCVD方法获得p-ZnSe,p-ZnSSe受主浓度为3×1017cm-3和8×1016~2×1017cm-3的条件下,生长制备了n-ZnSSen-ZnSe/ZnCdSe/p-ZnSep-ZnSSe的ZnSeLD结构。在经解理约为1mm腔长样品上,在77K,观测到其蓝绿发光峰值半高宽随脉冲电压增加出现窄化现象,表明有激射产生。
The p type doping of ZnSe and ZnS 0.09 Se 0.91 grown by photo assisted low pressure metal organic vapour deposition (LP MOCVD) was obtained.Their hole concentrations were 3×10 17 cm -3 and 8×10 16 ~2×10 17 cm -3 respectively.The sample were grown on (100) GaAs substrates using dimethyzinc (DMZn),dimethyselenium (DMSe) and tertiary butylamine (tBNH 2) as source materials.The profiled quartz reactor with an optical window for light irradiation was used.The light source was a 200W Hg lamp.The growing surface was irradiated with the power of 10 mW/cm 2~40 mW/cm 2.We prepared ZnSeCd/ZnSe/ZnSSe laser diode (LD) structures.At 77 K the blue green stimulated emission in ZnSe LD structure was observed at pulse voltage.
出处
《光电子.激光》
EI
CAS
CSCD
1999年第1期83-84,共2页
Journal of Optoelectronics·Laser
基金
国家自然科学基金