用同步辐射光刻直接在有机玻璃板上制备高深宽比亚微米光栅

Fabrication of High Aspect Ratio Sub-micron Gratings on PMMA Plate Based on Synchrony Radiation Lithography

为了将平面金属膜紧密耦合到纳米光栅形成的表面等离子体共振传感器,以提高灵敏度,以及利用亚微米光栅调整共振反射波长,需要制备亚微米结构光栅。介绍了一种基于X光光刻的亚微米结构光栅的制造技术。该结构光栅是利用日本立命馆大学的同步辐射光源进行同步辐射光光刻,在有机玻璃(PMMA)板上直接得到亚微米光栅。用此纳米加工技术获得的光栅线宽为250 nm,周期为500 nm,深宽比为8的PMMA亚微米结构光栅。还优化了曝光近接间隔、曝光剂量和显影时间等同步辐射光刻参数。

In order to increase the sensitivity of surface plasmon resonance sensors through planar metallic film closely coupled to nano-gratings and use grating period to adjust the wavelength of resonance reflection,sub-micron gratings is needed.The fabrication technique for sub-micro gratings structure is introduced.The sub-micron gratings are fabricated by synchrotron radiation（SR） lithography with SR source at Ritsumeikan University,Japan,and polymethylmethacrylate（PMMA） is used as X-ray resist.The 250 nm-width with 500 nm period pattern is successfully fabricated.The sub-micron grating with the aspect ratio of 8 is achieved.The lithography parameters such as proximity gap of exposure,the exposure dosage,and the development time influencing the structure are optimized to fabricate the gratings.