GaN材料中离子注入的研究进展

Development of Ion-implantation Research in Gallium Nitride Material

综述了GaN材料中离子注入的研究进展,重点介绍了离子注入技木在 GaN材料中的发光(PL,EL,CL)研究,注入隔离,p-型/n-型掺杂和深能级缺陷研究中的应用。

In this paper,we present a review of the application of the ion-implantatin technology in GaN ma-terials, with emphasis on its application in studies on luminescences (PL. EL. CL). on implantation isolation,on n-/p-doing and on deep-level defects.