化学气相沉积/渗透技术综述

A Review of Chemical Vapour Deposition/ Infiltration Technology

综述了化学气相沉积（ＣＶＤ）技术的最新发展，包括金属有机化合物化学气相沉积、等离子辅助化学气相沉积、激光化学气相沉积；同时介绍了三种用于制备工程材料的快速致密化化学气相渗透（ＣＶＩ）技术，包括强迫流动热梯度化学气相渗透、化学液相沉积、感应加热热梯度快速致密化技术。

The processing of chemical vapour deposition (CVD) and recent development are briefly reviewed , including metallic organic compounds chemical vapour deposition, plasma aided chemical vapour deposition, laser chemical vapour deposition. Meanwhile, 3 rapid densification chemical vapour infiltration technologies for fabrication of engineering materials, such as forced flow thermal gradient chemical vapour infiltration, densifacation by liquid precursor, induction heating thermal gradient rapid densification are presented.