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电磁辅助纳米压印 被引量:1

Electromagnet-assisted Nanoimprint Technology
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摘要 纳米压印技术是最近十几年提出的新的图形转移技术,此技术有产量高、成本低和工艺简单的优点,因此得到了飞速的发展。传统的纳米技术有热塑纳米压印技术、紫外固化纳米压印技术和微接触纳米压印技术。近几年又出现了纳米压印技术的新方法,如金属薄膜直写技术、滚轴式纳米压印技术、气压辅助纳米压印技术和静电辅助纳米压印技术。主要介绍利用静电辅助压印技术和气压辅助纳米压印技术相结合的一种新型纳米压印方法,并利用仿真软件Ansys进行仿真,通过仿真实验和理论研究,证明此方法是可行的。 Nanoimprint technology is a new graphics transfer technology, this technology has the advantages of high yield, low cost, simple process, it has made rapid development. Nanoimprint technology conventional thermoplastic nanoimprint lithography, UV -curing nano -imprint technology, micro -contact nano - imprint technology. In recent years, it has emerged nanoimprint new technology methods, such as metal fihns direct writing technology, roller- type nanoimprint technology, pressure -assisted nanoim- print technology, electrostatic - assisted nanoimprint technology. Describe the use of static pressure -assisted imprint technology electrostatic - assisted nanoimprint, supporting a combination of a new type of nanoimprint method, and the use of simulation software ansys simulation, simulation experiments and theoretical studies show that this method is feasible.
作者 段智勇 罗康
机构地区 郑州大学
出处 《电子工艺技术》 2010年第3期132-134,140,共4页 Electronics Process Technology
基金 河南省教育厅自然科学基金(项目编号:NO.2009A140008)
关键词 纳米压印 气压辅助压印 静电辅助压印 ANSYS Nanoimprint lithography Pressure - assisted nanoimprint Electrostatic - assisted nanoimprint Ansys
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参考文献11

  • 1Stephen Y Chou, Peter R Krauss, Preston J Renstrom. Imprint of Sub - 25 nm vias and trenches in polymers [ J ]. Applied physics letters, 1995,67 { 21 ) :3114 - 3116.
  • 2罗康,段智勇.纳米压印技术进展及应用[J].电子工艺技术,2009,30(5):253-257. 被引量:10
  • 3孙洪文,刘景全,陈迪.低温纳米压印技术制备微纳图案的研究[J].电子工艺技术,2008,29(6):314-316. 被引量:3
  • 4Stephen Y Chou, Peter R Krauss, Preston J Renstrom. Imprint lithography with 25 - nanometer resolution [ J ]. Science, 1996,272 (5258) : 85 - 87.
  • 5Colburn M, Johnson S, Damle S Bailey T et al. Step and flash imprint lithography : a new approach to high - resolution patterning [ C ]. Proceeding SPIE, 1999 : 379 - 389.
  • 6Xia Y, Whitesides G M, Annu. Soft Lithography [ J ]. Rev Mater Sci, 1998 (28) : 153 - 184.
  • 7Chien - Hung Lin, Rong - shun Chen, Chien - Chang Sun. UltrasoniCs for nanoimprint lithography [ C ]. Proceedings of 2005 5th IEEE conference on nanoteehnology. July 2005 in Nagoya ,Japan.
  • 8Yao C H, Wu C L, Sung C K. Effect of thin film properties on matallic pattern formation by direct nanoimprint [ J ]. Journal of materials processing technology, 2008,765 - 769.
  • 9Stephen Y Chou, Chris Keimel, Jian Gu. Uhrafast and direct Imprint of nanostructure in silicon[ J ]. Nature,2002, 417:835 - 837.
  • 10Shuhuai Lan, Hyejin Lee,Jun Ni et al. Survey on roller - type nanoimprint lithography (RNIL) process [ C ]. International conference on smart manufacturing application, Gyeonggi - do, Korea 2008.

二级参考文献25

  • 1Moore G E. Cramming more components onto integrated circuits [ J ]. Electronics, 1965,38 ( 8 ) : 114 - 117.
  • 2Reichardt R. Moore's Law and the pace of change[J]. Internet reference services quarterly,2006,11 (3) : 117 - 124.
  • 3Switkes M, Rothschild M. Immersion lithography at 157 nm [J].J vac sci technol. B,2001,19{6) : 2 353 -2 356.
  • 4Smith B W,Bourov A,Fan Y F et al. Amphibian XIS:An Immersion lithography microstepper platform[ C ]. Bellingham WA proceedings of SPIE optical microlithography XVIII,2005, 5 754:751 - 759.
  • 5Gil D, Brenner T A, Fonseca C et al. Immersion lithography: New opportunities for semieonductor manufaeturing [J]. J vae sci teehnol B,2004,22(6) :3431 -3438.
  • 6Rothschild M, Bloomstein T M, Kunz R R et al. Liquid immersion lithography : Why how and when [ J ]. J vac sci technol B,2004,22(6} :2 877 -2 881.
  • 7Chou S Y, Krauss P R, Renstrom P J. Imprint of sub - 25 nm vias and trenches in polymers [ J ]. Appl phys lett, 1995,67:3114-3116.
  • 8Fan X, Zhang H, Liu S et al. NIL - A low - cost and high -throughput MEMS fabrication method compatible with IC manufacturing technology [ J ]. Microelectronics journal,37(2) :121 - 126.
  • 9Miyauch A. Nanoimprint technology and applications [ J ]. Journal of photopolymer science and technology, 2005,18 (4) :523 -524.
  • 10Malyarchuk V, Hua F, Mack N H et al. High performance plasmonic crystal sensor formed by soft nanoimprint lithography [ J ]. Optics express ,2005,13 (15) :5669 - 5675.

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