摘要
采用射频磁控溅射法在40Cr基体上制备了非晶态Al2O3薄膜,并研究了工艺参数(溅射功率,工作气压,溅射时间)、预处理工艺以及中间层对薄膜结合性能的影响。试验结果表明,采用射频溅射法,在功率为250W、工作气压为5.0Pa、时间为3h条件下制备的薄膜结合力最好。基体经过腐蚀预处理和加入镍磷中间层均能改善膜基结合力,后者效果更显著。
Amorphous Al2O3 films on 40Cr steel were prepared by radio frequence (RF) magnetron sputtering method.Influence of processing parameters,pretreatment and interlayer on adhesion of the films were investigated.The results show that films prepared by RF magnetron sputtering at the power of 250W,the pressure of 3.0Pa and the time of 3h have the best adhesion.Both the pretreatment of the substrate and the Ni-P interlayer can improve the adhesion between the film and the substrate,especialy the Ni-P interlayer.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2010年第5期794-796,799,共4页
Journal of Functional Materials
基金
江苏高校省级重点实验室开放基金资助项目(kjsmcx06005)