新型低温等离子体技术及应用

Introduction to New Low-Temperature Plasmas and Their Applications

等离子体尤其是低温等离子体由于其一系列特殊的性质,广泛应用于薄膜沉积、微电路干法刻蚀、材料表面改性等方面。本文介绍了目前经常采用的几种新型低温等离子体技术,电子回旋共振(ECR)等离子体、射频感应耦合(ICP)等离子体、以及螺旋波(HWP)等离子体。这几种等离子体由于无内电极放电无污染、等离子体密度高、能量转换率高、电离度高等优点必将在传统工艺的基础上得到更广泛的应用。

Plasmas, especially low-temperature plasmas have been widely applied to depositing thin films, dry etching, and modifying material surface. This paper introduces several new types of plasma, including electron cyclotron resonance plasma, inductively coupled plasma and helicon wave plasma. These types of plasmas have great potential application in industry.