铜-钨(钼)薄膜制备及应用的研究进展

Preparation and Applications of Cu-W(Mo) Thin Films

介绍了近年来铜-钨(钼)薄膜涂层的制备方法,包括溅射沉积法、离子束辅助沉积法、离子束混合法、电子束蒸发法。重点介绍了溅射法中的磁控溅射法和离子束溅射沉积法,分析了薄膜的结构特征及其在固体润滑剂、电子设备、表面修饰材料等领域的应用,并展望了未来的研究方向和应用前景,指出制备散热材料是未来铜-钨(钼)薄膜研究的主流方向。

The preparation methods of Cu-W（Mo） thin films have been introduced in the recent years,including sputter deposition,ion beam assisted deposition,ion beam mixing,electron beam evaporation.It highlighted the magnetron sputtering and ion beam sputtering deposition method in sputtering method,simply analyzed the structural characteristics of thin film and applications of solid lubricants,electronic devices,surface modification of materials,prospected for future research and application prospects and pointed out the heat-removing material was the mainstream of Cu-W（Mo） thin film in the future.