基于TSMC55工艺的ELC流程

ELC process with TSMC55 technology

相对于TSMC65纳米工艺,TSMC55纳米工艺提供了更小的面积、更快的速度。ELC不仅可以检查厂商提供的65纳米标准单元库,还可以产生相应的55纳米标准单元库。本文首先介绍了ELC特征化技术原理,在没有相应ARM55标准单元库的情况下,通过对ARM65标准单元库进行ELC特征化流程,得到速度更快的ARM55标准单元库。并将其应用在实际的设计中进行综合,综合结果与厂商提供的经验值一致。

Compared with TSMC 65 nm technology, TSMC 55 nm technology can provide smaller area and higher frequency. ELC （ Encounter Library Characterization ） not only can check the 65nm standard cell library from foundry, but also can generate the corresponding 55 nm standard cell library. This paper firstly presents a simple view of the ELC design concept, then we generate the 55nm standard cell library by applying ELC design flow on 65nm standard cell library and use it in an actual design synthesis. Experimental results demonstrate perfect consistency with values provided by foundry.