摘要
采用热氧化法在多晶硅及单晶硅大面积太阳电池上生长二氧化硅钝化膜,结合丝网印刷制电极及二氧化钛减反射膜工艺,使太阳电池的扩散长度及效率得到改进。也进行了在多晶硅太阳电池上采用等离子沉积法制作氮化硅减反射膜的研究。
The method of thermal oxidation was used to deposit SiO 2 film for passivation of single and polycrystalline solar cells that was combined with the process of screen printing of contact and antireflection coating of TiO x.The improvement of diffusion length and cell efficiency was found.The research also carried out for plasma enhanced CVD of Si 3N 4 film for antireflection coating.
出处
《太阳能学报》
EI
CAS
CSCD
北大核心
1999年第1期74-77,共4页
Acta Energiae Solaris Sinica
基金
国家自然科学基金
关键词
钝化膜
晶体硅
太阳电池
丝网印刷法
passivating film,crystalline silicon solar cell,silicon nitride film,screen printing