摘要
采用控电位的沉积方式在半导体硅上制备出NiPdP薄膜,结果表明镀液中H3PO3含量的增加对P、Ni的析出有促进作用,对Pd的析出有抑制作用.随pH值的升高,镍含量不断升高,Pd、P含量不断下降.P含量对薄膜内应力有很大影响,含P质量分数为149%的NiPdP镀层表面上有许多裂缝,当P含量增加到261%时,镀层表面的裂缝已基本消失,继续增加P含量到350%时,裂缝完全消失.NiPdP镀层的结构与其组成密切相关,P含量小于200%的NiPdP镀层形成的是面心立方结构的固溶体.P含量大于400%的薄膜为非晶态结构.
Ni Pd P film was formed on semiconductor silicon by potential controlled electrodeposition technique. Results showed that addition of H 3PO 3 improved the deposition of Ni and P. With increase of pH of the plating solution, the content of Ni was increased and the Pd and P contents were decreased. The composition of P had a great effect on the inter stress of the film. Many cracks were found on the surface of the film containing 1 49% P, but they disappeared entirely when the P content was 3 50%. Deposit containing lower than 2% P was a solid solution with fcc structure. The structure changed from crystal to amorphous when P content was higher than 4%.
出处
《应用化学》
CAS
CSCD
北大核心
1999年第1期16-20,共5页
Chinese Journal of Applied Chemistry
基金
国家自然科学基金
关键词
半导体硅
电沉积
结构
镀层
镍钯磷薄膜
semiconductor silicon,Ni Pd P film,electrodeposition,structure