低压化学气相沉积法制备TiO_2膜的研究

STUDY ON TiO 2 FILMS DEPOSITED BY LOW PRESSURE CHEMICAL VAPOUR DEPOSITION

以四异丙醇钛为原料，采用低压化学气相沉积法研究ＴｉＯ２薄膜的沉积条件。采用紫外光谱、Ｘ射线衍射、扫描电镜等测试手段对ＴｉＯ２膜的光学性质及结构形貌进行了表征。实验表明：ＴｉＯ２膜在可见光和近红外范围内的折光率为３．１５，比用常压法制备的ＴｉＯ２膜的折光率高出３６．５％。因而，低压化学气相沉积法是制备高折射率的ＴｉＯ２膜更有效的一种方法。

TiO 2 films were prepared by Low pressure chemical vapour deposition(LPCVD) from tetraiso propyl titanate (TPT).Their optical properties and structures were characterized by UV,XRD,SEM.The results show that in the visible and near infraved regions (300～900nm), an average refractive index of TiO 2 films deposited by LPCVD is 3.15, being 36.5% more than that of TiO 2 film deposited by CVD.Thus,LPCVD method is a more effective method to deposit TiO 2 film with higher refrative index.