过滤式阴极电弧沉积类金刚石薄膜的特性分析

CHARACTERIZATION OF DIAMOND LIKE CARBON FILM PREPARED BY VACUUM ARC DEPOSITION

利用自行研制的过滤式阴极电弧沉积装置，在硅片和高速钢基体材料上获得了类金刚石薄膜，分别采用扫描电镜、原子力显微镜、喇曼光谱以及磨损实验等手段对薄膜进行了分析研究。结果表明，所获得的类金刚石薄膜为非晶态，ｓｐ３含量最高达７０％；基体材料对成膜质量影响较大，在硅片上薄膜的摩擦系数可达０．０８；同时偏压的变化会引起喇曼谱线中Ｄ峰和Ｇ峰位置向低频移动，半高宽σＧ增大、σＤ减小。

Diamond like carbon films are successfully obtained on silicon and high speed steel substrates by using a self developed device of filtered vacuum arc deposition. The films are analyzed with SEM, AFM, Raman spectrum and wear test. The substrate affects greatly the film quality, and a change in the bias voltage applied across the substrate can result in a remarked change in μ D , μ G , σ D , and σ G  of the film′s Raman spectrum.