期刊文献+

GaN紫外光阴极材料的高低温两步制备实验研究 被引量:8

Experimental Investigation of High-Low-Temperature Two-Step Preparation of GaN UV Photocathode Material
原文传递
导出
摘要 GaN紫外光阴极是一种表面具有负电子亲和势(NEA)状态的光电发射材料,具有电子发射效率高、暗发射小、稳定性好等众多优点,是近年来得到迅速发展的一种新型高性能紫外探测材料。采用超高真空原子吸附工艺,对金属有机物化学汽相沉积(MOCVD)外延的p型GaN表面依次进行了高温净化、Cs/O激活、低温净化和Cs/O激活的高低温两步光阴极制备实验。实验结果表明,高温净化后的Cs/O激活可制备出量子效率约为20%的GaN紫外光阴极材料,第二步低温净化后GaN表面仍具有光电发射能力,经过Cs/O激活后可将阴极光电流恢复到接近高温激活结束后的水平,说明GaN阴极材料的制备只需单步高温激活完成。通过比较GaN与GaAs光阴极材料的高低温制备效果差异,对GaN光阴极制备工艺的机理进行了探讨。 GaN ultraviolet(UV)photocathode is a type of photoemission material with negative electron affinity(NEA)surface.The photocathode has high quantum efficiency,low dark current,good stability and many other virtues,therefore it has become a new-type UV detection material in recent years.Using atoms absorption technique in ultra-high vacuum system,experiments of high-low temperature two-step preparation are made on p-type MOCVD expitaxial GaN.The two-step preparation includes four steps,which are high temperature cleaning,Cs/O activation,low temperature cleaning and Cs/O activation.The experimental results show that GaN photocathode with about 20% quantum efficiency is obtained after high temperature cleaning and Cs/O activation.Photoemission current is still observed after low temperature cleaning.After subsequent Cs/O activation the photocurrent of photocathode can be restored,but the value is only close to the level after high temperature activation.This indicates that GaN photocathode material only needs single-step activation to be prepared.The differences of two-step preparation effects between GaN and GaAs photocathode material are compared,and preparation mechanisms of GaN photocathode is also discussed
出处 《光学学报》 EI CAS CSCD 北大核心 2010年第6期1734-1738,共5页 Acta Optica Sinica
基金 国家自然科学基金(60701013 60871012)资助课题
关键词 材料 负电子亲和势光电阴极 GaN紫外光电阴极 高低温两步激活 光电发射 表面净化 Cs/O吸附 materials negative electron affinity(NEA)photocathode GaN ultraviolet(UV)photocathode high-low-temperature two-step activation photoemission surface clean Cs/O adsorption
  • 相关文献

参考文献16

  • 1F. Machuca,Y. Sun,Z. Liu et al.. Prospect for high brightness III-nitride electron emitter [J]. J. Vac. Sci. Technol. B,2000,18(6):3042-3046.
  • 2Zhi Liu,Francisco Machuca,Piero Pianetta et al.. Electron scattering study within the depletion region of the GaN(0001) and the GaAs (100) surface [J]. Appl. Phys. Lett.,2004,85(9):1541-1543.
  • 3O. Siegmund,J. Vallerga,J. Mcphate et al.. Development of GaN photocathodes for UV detectors [J]. Nucl. Instrum. Meth. A,2006,567(1):89-92.
  • 4J. Stock,G. Hilton,T. Norton et al.. Progress on development of UV photocathodes for photon-counting applications at NASA GSFC [C]. SPIE,2005,5898:106-109.
  • 5M. P. Ulmera,B. W. Wesselsb,B. Hanb et al.. Advances in wide-band-gap semiconductor based photocathode devices for low light level applications [C]. SPIE,2003,5164:144-154.
  • 6Du Xiaoqing,Chang Benkang. Angle-dependent X-ray photoelectron spectroscopy study of the mechanisms of "high-low temperature" activation of GaAs photocathode [J]. Appl. Surf. Sci.,2005,251(1-4):267-272.
  • 7Zou Jijun,Chang Benkang,Yang Zhi et al.. Evolution of surface potential barrier for negative-electron-affinity GaAs photocathodes [J]. J. Appl. Phys.,2009,105(1):48-52.
  • 8邹继军,陈怀林,常本康,王世允.GaAs光电阴极表面电子逸出概率与波长关系的研究[J].光学学报,2006,26(9):1400-1403. 被引量:11
  • 9C. I. Wu,A. Kahn. Negative electron affinity and electron emission at cesiated GaN and AlN surfaces [J]. Appl. Surf. Sci.,2000,162-163:250-255.
  • 10邹继军,高频,杨智,常本康.低温处理温度对GaAs光电阴极激活结果的影响[J].真空科学与技术学报,2007,27(3):222-225. 被引量:5

二级参考文献85

共引文献45

同被引文献67

引证文献8

二级引证文献9

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部