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Preparation of high performance thin-film polarizers 被引量：1

Preparation of high performance thin-film polarizers
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摘要 The optical performance of thin film polarizers is highly sensitive to the layer thicknesses of thin film.The thicknesses of the sensitive layers are optimized in order to gain broader polarizing zone in such case when the total layer thickness does not increase.An automatic layer thickness control system is established,and errors caused by different monitoring methods are analyzed.With this thickness control system,thin-film polarizers with Tp higher than 98%and Tp/Ts higher than 200：1（Tp and Ts are transmissions for p- and s-polarizations,respectively） with the bandwidth of 11 nm are prepared.Using the system allows for optimum repeatability of three successive runs. The optical performance of thin film polarizers is highly sensitive to the layer thicknesses of thin film.The thicknesses of the sensitive layers are optimized in order to gain broader polarizing zone in such case when the total layer thickness does not increase.An automatic layer thickness control system is established,and errors caused by different monitoring methods are analyzed.With this thickness control system,thin-film polarizers with Tp higher than 98%and Tp/Ts higher than 200：1（Tp and Ts are transmissions for p- and s-polarizations,respectively） with the bandwidth of 11 nm are prepared.Using the system allows for optimum repeatability of three successive runs.
作者 朱美萍 易葵 张伟丽 范正修 贺洪波 邵建达
机构地区 Key Laboratory of High Power Laser Materials Graduate University of Chinese Academy of Sciences
出处 《Chinese Optics Letters》 SCIE EI CAS CSCD 2010年第6期624-626,共3页 中国光学快报（英文版）
关键词 Control systems Optical instruments Thickness control Thin films Control systems Optical instruments Thickness control Thin films
分类号 O484.41 [理学—固体物理] O436.3 [机械工程—光学工程]
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参考文献11

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同被引文献28

  • 1崔云,赵元安,晋云霞,范正修,邵建达.三倍频分光膜在1064nm的破斑特性研究[J].光学学报,2007,27(6):1129-1134. 被引量：10
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  • 3范正修,范瑞瑛,陆月妹.1.06um宽带硬膜偏振片的研制[J].红外与毫米波学报,1982,1(2):121-130.
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  • 7Genin F Y, Stolz C J, Reitter T A, et al. Effect of electric field distribution on the morphologies of laser induced damage in hafnia silica mul tilayer polarizers[C]//Proc of SHE. 1997:342-352.
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Chinese Optics Letters
2010年 第6期

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