ZnO纳米薄膜的电化学制备及其AFM形貌表征

Preparation of ZnO Nanofilm with Electrodeposition and AFM Characterization

利用恒电位电化学沉积方法在ITO导电玻璃基底上制备了纳米ZnO薄膜,并利用原子力显微镜进行了形貌表征。结果显示,当沉积电压为0.8 V时,经过30 min的沉积在基底上形成了由规则排列的三角形ZnO晶粒构成的纳米薄膜。对晶粒的形成机理进行了初步的讨论。

The ZnO nanofilm was prepared on the ITO substrate with eleetrodeposition, and the morphology of the film was characterized by AFM. The results indicate that when the bias was - 0. 8 V, we could obtain the ZnO nano film composed of triangle-shaped ZnO crystal grains after 30min deposition. A brief discussion on the mechanism of the film growth was provided.