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SrRuO_3导电层对快速退火制备Pb(Zr,Ti)O_3薄膜结构和性能的影响 被引量:6

Effect of SrRuO_3 Conductive Layer on the Structure and Properties of Pb(Zr,Ti)O_3 Thin Films Prepared by Rapid Thermal Annealing
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摘要 采用溶胶-凝胶法在Pt/Ti/SiO2/Si基片上,制备了Pt/Pb(Zr,Ti)O3(PZT)/Pt和SrRuO3(SRO)/PZT/SrRuO3(SRO)异质结电容器,并研究了快速退火条件下SRO导电层对PZT结构和性能的影响。XRD测试表明,两种结构电容器中的PZT薄膜均为钙钛矿结构,SRO/PZT/SRO、Pt/PZT/Pt均具有较好的铁电性和脉宽依赖性,5V电压下两电容器的剩余极化强度Pr和矫顽电压Vc分别为28.3μC/cm2、1.2V和17.4μC/cm2、2.1V。在经过1010次翻转后,SRO/PZT/SRO铁电电容器疲劳特性相对于Pt/PZT/Pt电容器有了较大的改善,但SRO导电层的引入也带来了漏电流增大的问题。 Ferroelectric Pb(Zr,Ti)O3 (PZT) heterostructures were fabricated on Pt/Ti/SiO2/Si substrates by Sol-gel method with or without SrRuO3(SRO) conductive layer.Influences of SRO conductive layer prepared by rapid thermal annealing on the structure and physical properties of PZT films were studied by X-ray diffraction (XRD) and ferroelectric tester (Precision LC unit).X-ray diffractions show that the PZT thin films with or without SRO conductive layer are perovskite structure.Pr and Vc of SRO/PZT/SRO and Pt/PZT/Pt capacitors,measured at 5 V,are 28.3 μC/cm2,1.2 V and 17.4 μC/cm2,2.1 V,respectively.Both of the two kinds of PZT capacitors have shown good pulse width-dependent properties.The fatigue behavior of SRO/PZT/SRO heterostructure is improved while the Pt/PZT/Pt heterostructure fatigues seriously up to 1010 switching cycles.But the leakage current increases because of the introduction of the SRO conductive layer.
出处 《人工晶体学报》 EI CAS CSCD 北大核心 2010年第3期608-612,627,共6页 Journal of Synthetic Crystals
基金 国家自然科学基金(No.60876055) 河北省自然科学基金项目(E2008000620) 教育部科学技术研究重点项目(No.207013) 河北省应用基础研究计划重点基础研究项目(08965124D)
关键词 钌酸锶 锆钛酸铅 快速退火 SrRuO3 Pb(Zr Ti)O_3 rapid thermal annealing
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参考文献20

  • 1Auciello O, Scott J F, Ramesh R. The Physics of Ferroelectric Memories[J]. Phys. Today,1998,Sl(7) :22-27.
  • 2李丽,刘保亭,张新,闫小兵,郭颖楠.溶胶-凝胶法制备BiFeO_3薄膜的结构及物性研究[J].人工晶体学报,2008,37(6):1430-1434. 被引量:20
  • 3Pertsev N A, Kukhar V G, Kohlstedt H, et ai. Phase Diagrmns and Physical Properties of Single-domain Epitaxial Pb( Zr1-xTix)O3 Thin Films [ J ]. Physical Review B,2003,67 (5) :054107.
  • 4Liu B T, Yan X B, Zhang X, et al. Barrier Performance of Uhrathin Ni-Ti Film for Integrating Ferroelectric Capacitors on Si [ J ]. Appl. Phys. Lett. ,2007,91(14) :142908.
  • 5Bao D H, Scholz R, Alexe M, et al. Growth, Microstructure, and Ferroelectric Properties of Pb (Zr0.4 Ti0. 6 )O3/PbZrO3 Superlattices Prepared on SrTiO3 ( 100 ) Substrates by Pulsed Laser Deposition [ J ]. J. Appl. Phys. ,2007,101 (5) :054118.
  • 6Corkovic S, Whatmore R W, Zhang Q. Development of Residual Stress in Sol-gel Derived Pb (Zr, Ti)O3 Films: An Experimental Study [ J ]. J. Appl. Phys. ,2005,103(8) :084101.
  • 7Dawber M, Scott J F. A Model for Fatigue in Ferroelectric Perovskite Thin Films[J] .Appl. Phys. Lett. ,2000,76(8) :1060-1062.
  • 8Liu B T, Maki K, Aggarwal S, et al. Low-temperature Integration of Load-based Ferroelectric Capacitors on Si with Diffusion Barrier Layer[ J]. Appl. Phys. Lett. ,2002,80(19) :3599-3601.
  • 9Anderson P S, Guerin S, Hayden B E, et al. Synthesis of The Ferroelectric Solid Solution, Pb(Zr1-xTix)O3 on a Single Substrate Using a Modified Molecular Beam Epitaxy Technique[ J]. AppL Phys. Lett. ,2007,90(20) :202907.
  • 10Liu H, Zhu J G, Xiao D Q, et al. Influence of Electrode Configuration on Dielectric Properties of Ferroelectric Films with Interdigital and Parallel Plate Electrodes [ J ]. Appl. Phys. Lett. ,2007,91 ( 18 ) : 182907.

二级参考文献17

  • 1Pabst Gary W, Martin Lane W, Chu Ying-Hao, et al. Leakage Mechanisms in BiFeO3 Thin Films[J] .Appl. Phys. Lett. ,2007,90:072902.
  • 2Liu Z L, Liu H R, et al. Electric Properties of BiFeO3 Films Deposited on LaNiO3 by Sol-gel Process [ J ]. J. Appl. Phys. ,2006, 100:044110.
  • 3Yang H, Jain M, Suvorova N A, et al. Temperature-dependent Leakage Mechanisms of Pt/BiFeO3/SrRuO3 Thin Film Capacitors [ J]. Appl. Phys. Lett. ,2007,91:072911.
  • 4Lampert M A , Mark P. Current Injection in Solids[M]. Academic, New York, 1970.
  • 5Wang J, Neatan J B, Zheng H, et al. Epitaxial BiFeO3 Multiferroic Thin Film Heterostructures [ J ]. Science,2003,299 : 1719-1721.
  • 6Hill N A. Why are These So Few Magnetic Ferroelectrics [J]. J. Phys. Chem. B,2000,104:6694-6709.
  • 7Fiebig M, Lottermoser T, Frohlich D, et al. Observation of Coupled Magnetic and Electric Domains [J]. Nature,2002,419:818-820.
  • 8Hiqashiyama D, Miyasaka S. Control of the Ferroelectric Properties of DyMn2O5 by Magnetic Fields[J].Phys. Rev. B,2004,70:174405.
  • 9Chen F, Zhang Q F, Li J H, et al. Sol-gel Derived Muhiferroic BiFeO3 Ceramics with Large Polarization and Weak Ferromagnetism [J]. Appl. Phys. Lett. ,2006,89:092910.
  • 10Wang Y, Jiang Q H, He H C, et al. Multiferroic BiFeO3 Thin Films Prepared via a Simple Sol-gel Method [J].Appl. Phys. Lett. , 2006,88: 142503.

共引文献19

同被引文献73

  • 1朱满康,路朋献,侯育冬,严辉.Raman散射光谱定量分析铁电陶瓷掺杂诱导相转变现象[J].分析测试学报,2006,25(z1):14-15. 被引量:1
  • 2朱劲松,吕笑梅,朱曼,译.铁电存储器[M].北京:清华大学出版社,2004.
  • 3Haertling G H.Ferroelectric Ceramics:History and Technology[J].J.Am.Ceram.Soc.,1999,82(4):797-818.
  • 4Jaffe B,Roth R S,Marzullo S.Piezoelectric Properties of Lead Zirconate-titanate Solid-solution Ceramics[J].J.Appl.Phys.,1954,25(6):809-810.
  • 5Kholkin A L,Akdogan E K,Safari A,et al.Characterization of the Effective Electrostriction Coefficients in Ferroelectric Thin Films[J].J.Appl.Phys.,2001,89(12):8066-8073.
  • 6Chen S,Sun C.Ferroelectric Characteristics of Oriented Pb(Zr1-χTiχ)O3 Films[J].J.Appl.Phys.,2001,90(6):2970-2974.
  • 7Kanno I,Kotera H,Matsunaga T,et al.Intrinsic Crystalline Structure of Epitaxial Pb(Zr,Ti)O3 Thin Films[J].J.Appl.Phys.,2005,97(7):074101.
  • 8Oh S H,Jang H M.Epitaxial Pb(Zr,Ti)O3 Thin Films with Coexisting Tetragonal and Rhombohedral Phases[J].Phys.Rev.B,2001,63(13):132101.
  • 9Liao M,Gotoh Y,Tsuji H,et al.Piezoelectric Pb(Zr0.52Ti0.48)O3 Thin Films on Single Crystal Diamond:Structural,Electrical,Dielectric,and Field-effect-transistor Properties[J].J.Appl.Phys.,2010,107(2):024101.
  • 10Ambika D,Kumar V,lmai H,et al.Sol-gel Deposition and Piezoelectric Properties of {110}-oriented Pb(Zr0.52Ti0.48)O3 Thin Films[J].Appl.Phys.Lett.,2010,96(3):031909.

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