真空阴极弧离子镀类金刚石碳膜

Preparation of DLC Films by Vacuum Cathodic Arc Deposition

采用真空阴极弧离子镀的方法，以乙炔和氢气分别作工作介质，以氩气为稀释气体，研究了类金刚石碳（ＤＬＣ）膜的制备工艺及其结构和硬度．喇曼光谱分析表明，所得膜为典型的ＤＬＣ膜，表现为一个波数在１３００～１７００ｃｍ－１的宽峰，工艺不同，喇曼光谱曲线的形状也略有变化．ＳＥＭ分析表明所得ＤＬＣ膜结构致密光滑．纳米探头硬度表明，ＤＬＣ膜表面硬度均高于１０ＧＰａ．

This paper deals with diamond like carbon (DLC) films deposited by vacuum cathodic arc deposition in which the H 2 or C 2H 2 was used as feed gas and the Ar was used as background gas. We have investigated the cross section of the DLC films using SEM (scanning electronic microscope). The nano indent micro hardness show the films have very high hardness. The Raman shifts of DlC films have wide peaks between the wave number of 1300cm -1 and 1700cm -1 , and have little deference deposited in different environments.