柱面图形光学刻划的研究

Study of Cylindrical Image Photolithography

柱面涂胶问题、刻划间隙的选取及新型光刻掩模板的研制是柱面图形光学刻划需解决的三大关键问题，本文以这三个问题为中心详细讨论了在圆柱面上光刻图形的方法。

Coating on cylindrical blank,definition of lithographic gap and study of new type of mask are three problem required to be solved for cylindrical image photolithography.Surrounding the three problem,the method of cylindrical image photolithography is discussed in detail.