N,N-二甲基甲酰胺缓蚀膜的影响因素

Influence Factors of N,N-Dimethylformamide Self-Assembled Inhibition Monolayers

在金属铜表面制备各种N,N-二甲基甲酰胺自组装膜,用交流阻抗(AC)和循环伏安(CV)研究了形成组装膜的最佳浓度,最佳组装时间,以及在不同浓度的NaCl溶液中该膜对铜电极的缓蚀行为.

The different N,N-Dimethylformamide self-assembled momolayers were prepared on copper surfaces.The best assembly conditions such as concentration and time were selected by means of cyclic voltammecry and ac.Impedance techniques.Also,the inhibition effects of the N,N-Dimethylformamide self-assembled momolayers decreased with the increases of the NaCl concentrations.