摘要
采用多靶反应磁控溅射法制备了TiN/AlN纳米多层膜,并通过XRD、TEM和显微硬度计对多层膜的调制结构和力学性能进行了研究.结果表明,反应磁控溅射法制得的纳米多层膜调制界面平直清晰;薄膜的硬度随其调制周期Λ的减小而单调增加,硬度在Λ=2nm时达到最大值HK32.93GPa.
TiN/AlN nano multilayers were fabricated using multi target reactive sputtering method. The microstructure and hardness of nano multilayers were detected by XRD, TEM and microindentor respectively. The results show that the modulated interface of nano multilayers prepared in this way is smooth and clear; the hardness of TiN/AlN nano multilayers increases with the decrease of wavelength Λ and the maximum hardness reaches HK32.93 GPa at Λ =2 nm.
出处
《上海交通大学学报》
EI
CAS
CSCD
北大核心
1999年第2期159-161,共3页
Journal of Shanghai Jiaotong University
关键词
纳米多层薄膜
力学性能
氮化钛
氮化铝
制备
nano multilayers
reactive sputtering
modulation structure
microhardness