摘要
通过双靶轮流反应溅射的工艺方法制备了TiN/AlN纳米混合膜.采用XRD衍射、TEM和显微硬度等测试方法对TiN/AlN纳米混合膜的微结构和力学性能进行了研究.结果表明,TiN/AlN纳米混合膜的晶粒大小为10~20nm;薄膜总体表现出硬度增强效果,在TiN∶AlN(体积比)≈1∶1时,薄膜硬度获得极大值HK32.25GPa.
This paper researched TiN/AlN nano granular thin films, whose microstructure and hardness were detected by X ray diffraction, transmission electron microscopy and indentor respectively. The TiN/AlN nano granular thin films were prepared by rotating the substrates at speed of 20 r/min and the composition of them can be controlled by modifying the targets power. In the TiN/AlN nano granular thin films, the grain size is about 10~20 nm. The enhanced hardness reaches the maximum HK32.25GPa when TiN∶AlN≈1∶1.
出处
《上海交通大学学报》
EI
CAS
CSCD
北大核心
1999年第2期162-164,共3页
Journal of Shanghai Jiaotong University