期刊文献+

Barrier height and ideality factor dependency on identically produced small Au/p-Si Schottky barrier diodes

Barrier height and ideality factor dependency on identically produced small Au/p-Si Schottky barrier diodes
原文传递
导出
摘要 Small high-quality Au/P-Si Schottky barrier diodes(SBDs) with an extremely low reverse leakage current using wet lithography were produced.Their effective barrier heights(BHs) and ideality factors from current-voltage (Ⅰ-Ⅴ) characteristics were measured by a conducting probe atomic force microscope(C-AFM).In spite of the identical preparation of the diodes there was a diode-to-diode variation in ideality factor and barrier height parameters.By extrapolating the plots the built in potential of the Au /p-Si contact was obtained as V_(bi)=0.5425 V and the barrier height valueΦ_(b(c-V)) was calculated to beΦ_(B(C-V))=0.7145 V for Au/p-Si.It is found that for the diodes with diameters smaller than 100μm,the diode barrier height and ideality factor dependency to their diameters and correlation between the diode barrier height and its ideality factor are nonlinear,where similar to the earlier reported different metal semiconductor diodes in the literature,these parameters for the here manufactured diodes with diameters more than 100μm are also linear.Based on the very obvious sub-nanometer C-AFM produced pictures the scientific evidence behind this controversy is also explained. Small high-quality Au/P-Si Schottky barrier diodes(SBDs) with an extremely low reverse leakage current using wet lithography were produced.Their effective barrier heights(BHs) and ideality factors from current-voltage (Ⅰ-Ⅴ) characteristics were measured by a conducting probe atomic force microscope(C-AFM).In spite of the identical preparation of the diodes there was a diode-to-diode variation in ideality factor and barrier height parameters.By extrapolating the plots the built in potential of the Au /p-Si contact was obtained as V_(bi)=0.5425 V and the barrier height valueΦ_(b(c-V)) was calculated to beΦ_(B(C-V))=0.7145 V for Au/p-Si.It is found that for the diodes with diameters smaller than 100μm,the diode barrier height and ideality factor dependency to their diameters and correlation between the diode barrier height and its ideality factor are nonlinear,where similar to the earlier reported different metal semiconductor diodes in the literature,these parameters for the here manufactured diodes with diameters more than 100μm are also linear.Based on the very obvious sub-nanometer C-AFM produced pictures the scientific evidence behind this controversy is also explained.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2010年第7期16-21,共6页 半导体学报(英文版)
关键词 Schottky barrier diodes conducting probe-atomic force microscope barrier height and ideality factor Schottky barrier diodes conducting probe-atomic force microscope barrier height and ideality factor
  • 相关文献

参考文献33

  • 1Schottky W. Halbleitertheorie der Sperrschicht. Naturwissenchaften, 1938, 26:843.
  • 2Mott N F. Note on the contact between a metal and an insulator or semiconductor. Proc Cambridge Philos Soc, 1938, 34:568.
  • 3Bardeen J. Surface states and rectification at a metal semiconductor contact. Phys Rev, 1947, 71:717.
  • 4Song Y P, van Meirhaeghe R L, Laflere W H, et al. On the difference in apparent barrier height as obtained from capacitancevoltage and current-voltage-temperature measurements on Al/p- InP Schottky barriers. Solid-State Electron, 1986, 29:633.
  • 5Tung R T. Electron transport at metal-semiconductor interfaces: general theory. Phys Rev B, 1992, 45:13509.
  • 6Sullivan J P, Tung R T, Pinto M R, et al. Electron transport of inhomogeneous Schottky barriers: a numerical study. J Appl Phys, 1991, 70:7403.
  • 7Tung R T. Recent advances in Schottky barrier concepts. Mater Sci Eng R, 2001, 35: 1, 83, 101.
  • 8Tung R T. In: Brilson L J, ed. Contacts to semiconductors. New Jersey: Noyes Publishers, 1993.
  • 9Wemer J H, Guttler H H. Barrier inhomogeneities at Schottky contacts. J Appl Phys, 1991, 69:1522.
  • 10Biber M, Cakar M, Turut A. The effect of anodic oxide treatment on n-GaAs Schottky barrier diodes. J Mater Sci Mater Electron, 2001, 12:575.

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部