原子光刻中的原子沉积数值模拟

Numerical simulation of atomic deposition in the atom lithography

近年来,有关原子光刻的实验研究得到了快速发展,并取得了一系列重大的实验进展。在原子光刻中,对不同原子在各种条件下的沉积过程的研究是具有非常重要的意义的。现利用有限差分法求解光与原子作用的薛定谔方程分析了激光功率、失谐量、腰斑大小以及原子纵向速度对汇聚效果的影响,总结了一些原子在驻波场中各项参数对沉积效果的影响。

The experimental researches on atom lithography got a rapid development these years and have made a series of significant progress. The research of the processes of atomic deposition using different atoms in various conditions has an important significance. The finitedifferences approximation is used to solve a Schrodinger equation describing the atom-laser field interactions. The effect of laser power, detuning, waist radius and longitudinal velocity of atoms to focusing are analyzed. The effects by some parameter to the atoms in a laser standing wave field are got