新型电流变抛光工具开发及其抛光实验

Development of new type ER fluid-assisted polishing tool and its polishing experiment

针对当前电流变抛光研究中所用尖锥状工具要求抛光间隙为μm级、对设备定位精度要求高及抛光非导体需加辅助电极等不足,研制了一种新型的电流变抛光工具——集成电极工具。介绍了集成电极工具的结构,并对其电场分布进行了计算。新工具不仅可以抛光导体工件,而且也可以抛光非导体工件。工具与工件之间的抛光间隙可以大到mm数量级。以碳化钨(WC)和光学玻璃为对象,分别进行了抛光实验,并通过单因素实验给出了电压、转速、磨料浓度、抛光时间等因素与表面粗糙度的关系曲线。实验结果表明:抛光10min后,WC的表面粗糙度由Ra66.48nm下降到Ra33.18nm;光学玻璃的表面粗糙度由Ra11.02nm下降到Ra3.67nm。

Aiming at the shortages of the tip-shaped electrode tool that is used in current researches on electrorheological（ ER） fluid-assisted polishing,for example,requiring the polishing gap between tool and workpiece surface in order of magnitude of μm and corresponding high equipment positioning accuracy,as well as need for the auxiliary electrode to polish the non-conductive workpiece,a new type of integrated electrode polishing tool was developed. The construction of the tool was described and its electric field was calculated. With this tool the polishing gap can reach to the order of magnitude of mm. The tool can polish conductive as well as non-conductive workpiece. The polishing experiments were made on the workpiece of WC and optical glass with the new tool. The relationships between the surface roughness and electric voltage,rotating speed, concentration of abrasive particles,polishing time,etc. ,were given by individual-factor experiments. The experimental results show that,after 10 min polishing,the surface roughness of WC workpiece is dropped from Ra 66. 48 nm to 33. 18 nm,and for optical glass from Ra 11. 02 nm to 3. 67 nm.