脉冲电源辉光等离子渗Ti的工艺研究

Study on Titanizing Technique by Pulse Power Glow Plasma

在低碳钢表面利用脉冲电源进行辉光离子渗Ti工艺研究。结果表明:在本工艺条件下,能够获得200μm以上的渗层,其组织形貌为渗层与基体之间形成一条明显的反应扩散分界线,且分界线两边均出现较为明显的柱状晶;渗Ti层的结构主要由Fe2Ti、Fe-Ti、TiC相组成;随着电压的升高,渗Ti层增加,550V时达到最厚,表面Ti含量也最高,当电压超过550V后,渗层厚度减小、Ti含量降低;随时间的增长,渗Ti层厚度增加,表面Ti的含量增加;渗层厚度随温度的升高而变厚,渗层Ti的含量也随之变大。

A titanizing technique by pulse power glow plasma was studied on low-carbon steel. Results show that under the condition of the technique, the titanized layer thicker than 200 μm can be obtained; the layer has a distinct reaction-diffusion line between the layer and the substrate and on both sides of the line there are obvious columnar crystals. The titanized layer microstructure is composed of Fe2Ti, Fe-Ti and TiC. With increase of the voltage, the layer becomes thicker and at 550 V it is the thickest, when the Ti content is highest. However, when the voltage exceeds 550 V, the thickness and Ti content of the layer decrease. With increase of time, the thickness and Ti content of the layer increase. While with higher temperature, the thickness the Ti content of the layer increase, too.