摘要
Deposition patterns of tetracyanoquinodimethane （TCNQ） molecules on different surfaces are investigated by atomic force microscopy. A homemade physical vapour deposition system allows the better control of molecule deposition. Taking advantage of this system, we investigate TCNQ thin film growth on both SiO2 and mica surfaces. It is found that dense island patterns form at a high deposition rate, and a unique seahorse-like pattern forms at a low deposition rate. Growth patterns on different substrates suggest that the fractal pattern formation is dominated by molecule-molecule interaction. Finally, a phenomenal ＂two-branch＂ model is proposed to simulate the growth process of the seahorse pattern.
Deposition patterns of tetracyanoquinodimethane （TCNQ） molecules on different surfaces are investigated by atomic force microscopy. A homemade physical vapour deposition system allows the better control of molecule deposition. Taking advantage of this system, we investigate TCNQ thin film growth on both SiO2 and mica surfaces. It is found that dense island patterns form at a high deposition rate, and a unique seahorse-like pattern forms at a low deposition rate. Growth patterns on different substrates suggest that the fractal pattern formation is dominated by molecule-molecule interaction. Finally, a phenomenal ＂two-branch＂ model is proposed to simulate the growth process of the seahorse pattern.
基金
Project supported by the National Natural Science Foundation of China(Grant No.10774176)
the National Basic Research Program of China(Grant No.2006CB806202)
