化学机械抛光垫沟槽形状的研究及展望

Study and Outlook on Groove Shape of CMP Polishing Pad

在化学机械抛光过程中,沟槽形状是抛光垫性能的重要影响因素之一,它会直接影响抛光效果。本文介绍了化学机械抛光垫上沟槽的基本形状及其对抛光效果的影响,以及不同复合形状的抛光垫沟槽及其对抛光效果的影响,并就研究中现存的主要问题提出展望。

In the chemical and mechanical polishing process, the groove shape is one of the most critical elements that affect polishing pad performance, which directly influences the polishing process and results. The basic patterns of groove shape and their effects on polishing are described. Various sorts of groove shape with complex components and their effects on polishing are also described. The expectation for the solution of present problems in research and is proposed in the final part of the paper.