摘要
采用直流磁控溅射法在柔性Kapton基片上制备了三明治结构的FeCoSiB/Cu/FeCoSiB多层膜,研究了多层膜的交流阻抗随外加应力变化的规律。测试结果表明,三明治结构多层膜的阻抗随外加应力的增大而增大,应力阻抗效应随中间导电层厚度以及铁磁层厚度的增加而增强,同时应力阻抗效应也与测试频率密切相关。
FeCoSiB/Cu/FeCoSiB muhilayer films are deposited on Kapton flexible substrate by DC magnetron sputtering. The influences of external stress on the impedance of the muhilayer films are studied. The results show that the impedance of the sandwich muhilayer increases with the increase of the applied stress. The stress impedance effect is improved with the increase of the thickness of the conducting layer or the magnetic layer. The stress impeda- nce effect is also dependent on the working frequency.
出处
《材料导报》
EI
CAS
CSCD
北大核心
2010年第12期20-22,共3页
Materials Reports
基金
国家自然科学基金(50501004)
国防预研基金(9140A23060307DZ0223)
