摘要
利用离子束溅射的方法（ＩＢＳ）制备了Ｔｉ－Ｎｉ非晶合金薄膜，采用ＸＲＤ、ＳＥＭ方法研究了薄膜试样充放电前后的结构和形貌变化，采用电化学方法研究了这种材料的电化学贮氢性能，试样Ｔｉ５０Ｎｉ５０最高电化学容量可达４５８ｍＡｈ／ｇ。引用Ｈａｒｒｉｓ模型估算了Ｔｉ－Ｎｉ非晶合金薄膜的理论电化学贮氢容量，并用以分析实验结果。
The amorphous Ti-Ni hydrogen-storage films are prepared by ion beam sputteringtechnology and electrochemical characteristic is researched. The structure and morphology of filmsbefore and after charge-discharge cycle are researched by X-ray diffraction(XRD) and scan electronmicroscope (SEM). The highest discharge capacity of sample Ti50Ni50 is 458mAh/g. The Harris theory isadopted to analyze the experimental results.
出处
《金属功能材料》
CAS
1999年第1期25-28,共4页
Metallic Functional Materials
基金
自然科学基金
