摘要
采用磁控溅射离子镀技术在贫铀表面以不同偏压制备了铌镀层,利用X射线衍射仪和扫描电镜对镀层的组织结构进行了表征,利用扫描电镜与俄歇电子能谱仪对镀层与基体的界面特性进行了研究。结果表明:铌镀层平整致密,但存在靶材飞溅颗粒形成的镀层缺陷,铌镀层为体心立方结构,存在择优取向、内应力以及晶粒细化等特性且为纳米镀层;铌镀层沿基体表面的法线方向生长且为典型的柱状结构,其表面为均匀的条状颗粒组织;铌镀层与铀基体结合紧密,且存在"伪扩散层"。
Nb coating was prepared with magnetron sputtering ion plating technology at different bias voltages on depleted U surface.Its microstructure was characterized by X-ray diffractor(XRD)and scanning electron microscope(SEM).The interfacial characteristic between Nb coating and U substrate was studied with SEM and auger electron spectroscopy.The results indicate that the coating is level and compact,but it has some defects of particle which is sputtered from the Nb target,its crystalline structure is body centered cubic(BCC).Nb coating has prefer-oriented,crystal-fined characteristic and internal stress.It's nano-crystalline coating.The Nb coating grows along the normal orientation of the substrate surface and appears classic columnar structure,its surface consists of uniform bar-shaped particles in microscope.The coating adheres to U substrate tightly,'pseudo-diffusion layer' presents in interfacial zone between them.
出处
《原子能科学技术》
EI
CAS
CSCD
北大核心
2010年第7期804-808,共5页
Atomic Energy Science and Technology
基金
中国工程物理研究院科学技术发展基金资助项目(2009B0203019)
关键词
铌镀层
组织结构
界面特性
贫铀
Nb coating
microstructure
interfacial characteristic
depleted U