摘要
利用热力学数据计算并绘制了NiPH2O系电位—pH图,根据电位—pH图分析了电沉积NiMo和NiMoP合金镀层的电化学行为;利用X射线衍射测试了NiMo和NiMoP镀层在镀态下的物相组成。热力学分析表明:Mo和P都难以单金属的形式沉积,它们必须和其它金属以诱导共沉积的方式才能沉积出来;P,Ni能以金属间化合物Ni3P的形式在阴极上沉积;Mo以两种形式进入阴极,一种为以MoO3固体颗粒复合电镀进入镀层,另一种为以金属间化合物的形态沉积。X射线衍射分析表明,P以Ni3P,Mo以MoO3与MoC的形式存在于镀层中,这一结果与热力学分析结论相一致。
The potential pH diagram of Ni P H 2O system was drawn by thermodynamical data, the electrochemical actions of electroplating Ni Mo and Ni Mo P alloys were analyzed. The phases of Ni Mo and Ni Mo P coatings were studied by means of XRD. The results showed that it is difficult to deposit Mo and P as single metal but they can be co deposited by inducing deposition with other metals, P and Ni are deposited in the form of intermetallic compound; Mo is deposited in the cathode by two forms, one is the form of MoO 3 solid particles and the other is the form of intermetallic compound. The XRD analysis is in agree with the thermodynamic analysis.
出处
《中国有色金属学报》
EI
CAS
CSCD
北大核心
1999年第1期159-164,共6页
The Chinese Journal of Nonferrous Metals