磁控溅射制备的氧化钒薄膜的结构研究

Structure Characterization of Vanadium Oxide Thin Films Prepared by Magnetron Sputtering Methods

用Ｘ射线光电子谱（ＸＰＳ），原子力显微镜（ＡＦＭ）和Ｘ射线衍射（ＸＲＤ）研究了磁控溅射制备的氧化钒薄膜的宏观、微观和电子学结构．建立了薄膜的相结构与ＸＰＳ谱中Ｖ２ｐ３／２特征峰的结合能之间的定量关系．给出了二氧化钒薄膜的ＡＦＭ像．所得到的二氧化钒热致变色薄膜的结构特性与光电特性相一致．

Vanadium oxide thin films prepared by magnetron sputtering methods have been studied by X ray photoelectron spectroscopy,atomic force microscopy and X ray diffraction. The quantitative relations between the phases of vanadium oxide films and the V 2 p 3/2 binding energy in the XPS were obtained. The AFM images show the vanadium dioxide thin films clearly. The electronic, micro and macro properties of VO 2 thin film are coincident with its optical and electrical measurements.