摘要
采用等离子体基氧离子注入技术对Ti6A14V合金进行表面处理。注入电压选取-30和-50kV。注入层的结构用X射线光电子能谱、小掠射角X射线衍射、Raman光谱进行表征。注入样品在注氧层中均形成了以TiO_2为主的键结构,-30kV低电压注入样品的注氧层中TiO_2为非晶态,经过500℃真空退火后,TiO_2结晶形成金红石。而-50kV高注入电压则可在注氧层中直接形成粒径为nm的金红石。
Ti6A14V was treated by oxygen plasma based ion implantation of-30 and-50 kV.The structure of the oxygen-implanted layer was characterized by X-ray photoelectron spectroscopy （XPS）,glancing angle X-ray diffraction （GXRD） and Raman spectra.TiO_2 is predominant in the implanted layer of all implanted sample.For the samples implanted at-30 kV,TiO_2 exists as amorphous,and annealing at 500~C in vacuum makes it crystal to form ruffle.However,the implantation at-50 kV can directly produce rutile.
基金
高等学校博士学科点专项科研基金(20040213048)
