直流电弧等离子体区域电弧分布特征对自支撑金刚石膜性质的影响

Effect of Area Arc Distribution on Properties of Free-standing Diamond Films in DC Arc Plasma Jet Deposition

直流电弧等离子体喷射法制备自支撑金刚石膜时,电弧区域可分为弧心、弧干和弧边三个区域。本文运用扫描电子显微镜(SEM)、X射线衍射(XRD)、激光Raman光谱、正电子湮没寿命谱(PAL)和力学性能实验机研究了同一块自支撑金刚石膜不同区域的生长面形貌、晶体取向、内应力、空位缺陷和断裂强度。结果表明:随着与直流电弧等离子体弧心距离增加金刚石膜生长更稳定,(220)取向晶粒减少,平均空位缺陷减少,内应力和断裂强度呈现先增大后减小的趋势。

The area arc distribution consist of arc center,arc main and arc edge in DC arc plasma jet method of deposition free-standing diamond films. The surface morphology,crystal orientation,internal stress,vacancy defects and fracture strengths of different areas in the same freestanding diamond were investigated by scanning electron microscope（ SEM） ,X-ray diffraction（ XRD） ,laser Raman spectrum,positron annihilation lifetime（ PAL） and mechanical property tester. The results showed that temperature was one of the most important factors influencing the qualities of freestanding CVD diamond films. As distance to the central plasma field increased,growth of diamond films was more stable. The （ 220） oriented grains and average vacancy defects in diamond films reduced. Internal stress and fracture strength increased at first then decreased.