摘要
用射频磁控溅射方法在玻璃基片上制备厚度为100 nm的Fe80Pt20薄膜,研究了退火对其结构和磁性的影响。随着退火温度的升高,观察到了Fe80Pt20薄膜从fcc相到可能的hcp相的相变。并且,当退火温度高于653 K时,薄膜的饱和磁化强度和矫顽力都发生显著的变化。不同温度退火薄膜的饱和磁化强度与温度的关系曲线也表明了这一相变。
The Fe80Pt20 films with thickness of 100 nm have been deposited on glass substrate by RF magnetron sputtering.The influence of annealing was investigated on the phase structure and magnetic property of the films.With increasing annealing temperature,the phase transformation from fcc to hcp was observed.Meanwhile,dramatic changes take place in both saturation magnetization and coercivity of the films when annealing temperature is higher than 653 K.The temperature dependence of the saturation magnetization has been also measured to understand this phase transformation.
出处
《磁性材料及器件》
CSCD
北大核心
2010年第4期18-19,34,共3页
Journal of Magnetic Materials and Devices
基金
国家自然科学基金资助项目(60803035)
关键词
FePt薄膜
退火
相变
微观结构
磁性能
FePt films
annealing
phase transformation
magnetic property
