等离子体基离子注入沉积DLC膜的划擦行为

Scratch behavior of DLC film deposited by plasma based ion implantation & deposition

采用等离子体基离子注入沉积技术以乙炔和氢气为气源,在造币模具钢表面制备了类金刚石碳(DLC)膜。采用划痕试验研究了在不同工艺参数下制备的DLC膜在与钢基体的结合力及其变化规律。结果表明,DLC膜临界载荷随着注入电流增加和注入电压降低而增加;随着C2H2/H2比例的增加,临界载荷先增加后减小;随着气压的增加,临界载荷也表现出先增加后减小的趋势。结合SEM分析结果对DLC膜剥落机制进行了探讨,表明DLC膜在划擦过程中首先发生膜和基体之间的层裂剥离,然后在垂直载载作用下发生破裂。

Diamond-like carbon（DLC）film was deposited on mintage mould steel by plasma based ion implantation deposition with feeding gas of C2H2 and H2.The binding force and corresponding change law between DLC films and steel substrate with various parameters were studied by scratch method.The results show that the critical load of DLC films increases with increase of implantation current and reduce of pulsed voltage.With increase of C2H2/H2 ratio and working pressure,the critical load increase at first,then decrease.The peeling-off mechanism of DLC films from substrate also was discussed based on SEM observation.The results indicate that a delamination between DLC film and substrate firstly occurs during scratch test,and then a crack of film happens under vertial load.