光刻机浸没液体控制系统的研究现状及进展

Developments and Prospects of Immersion Control System in Immersion Lithography Machine

浸没式光刻机是目前在45nm以下IC生产线上唯一获得应用的新光刻装备。浸没控制系统是浸没式光刻机的核心子系统之一,用于在最后一片投影物镜和硅片之间,提供并维持具有高度洁净度与稳定性的缝隙流场,利用高折射率浸没液体,提高光刻分辨率。介绍浸没控制系统的技术背景、组成及其特点,论述国外在液体浸没方式、液体动态密封、流场检测与控制、曝光热效应和气泡控制等关键技术方面的研究成果以及国内自主研发的进展。针对浸没式光刻机向着更高光刻分辨率和更高生产率不断延伸的特点,对浸没液体控制系统的发展前景进行展望,指出其发展中面临的挑战与有待解决的关键技术,浸没液体控制系统将在浸没式光刻机的发展过程中继续扮演着重要角色。

Immersion lithography machine is the only new equipment used at present for the IC production line below 45 nm.Immersion control system is one of the key components of immersion lithography machine,and its main function is to provide a highly clean and stable immersion liquid between the last one projection lens and wafer.As the refraction index of the liquid is higher than air,the resolution of lithography can be improved.In this paper,the technology background,composition and characteristics of immersion control system are introduced.The foreign research results of key technologies about liquid fill method,dynamic seal,flow detection and control,exposure thermal effect and air bubble control are discussed,and the progress of domestic research on the immersion control system is given.Finally,it is pointed out that there are some challenges and key technologies of immersion control system necessarily to be solved in future.The immersion control system will continue to play an important role in the developing process of immersion lithography machine.