摘要
In the fabrication of surface relief gratings （SRGs） on azobenzene polymer films with a zeroth-order suppressed diffraction phase mask, it is found that the SRGs＇ relief figure and period change with the irradiation time, and the period is doubled after a critical time. The time dependence of the changes in the SRG forming process is investigated by theoretical analysis and experiments. An optimum time range for inscription of the sub-micron SInGs is determined to be 5-8 rain in terms of both the theoretical and experimental results.
In the fabrication of surface relief gratings （SRGs） on azobenzene polymer films with a zeroth-order suppressed diffraction phase mask, it is found that the SRGs＇ relief figure and period change with the irradiation time, and the period is doubled after a critical time. The time dependence of the changes in the SRG forming process is investigated by theoretical analysis and experiments. An optimum time range for inscription of the sub-micron SInGs is determined to be 5-8 rain in terms of both the theoretical and experimental results.
基金
Supported by the National Natural Science Foundation of China under Grant Nos 50703038, 50773075 and 50533040, the Knowledge Innovation Project of Chinese Academy of Sciences （KJCX3.SYW.H02 and KJCX2-YW-M11）, China Postdoctoral Science Foundation （No 20100470038）, and the National Basic Research Program of China under Grant No 2006cb302900.
