TiN薄膜的制备及其纳米力学性能研究

Preparation and nano-mechanical properties of TiN films

采用磁控溅射工艺制备了TiN薄膜,借助X射线衍射仪（XRD）、场发射扫描电子显微镜（FESEM）、原子力显微镜（AFM）和纳米压痕仪（nano-indentation）等,研究了薄膜的相结构、表面微观形貌、纳米硬度、弹性模量等,讨论了薄膜制备工艺参数,如基体温度、溅射功率、基体负偏压等的影响.结果表明,Ti N薄膜为多晶态,溅射功率、基体负偏压和基体温度等条件对薄膜的形貌、结构及纳米硬度、弹性模量等的影响比较复杂.

In this paper,titanium nitride films were deposited by magnetron sputtering.The phase structure,surface morphology,nano-hardness,elastic modulus and residual stress of the films were respectively investigated with X-ray diffraction（XRD）,field emission scanning electron microscopy（FESEM）,atomic force microscopy（AFM） and nano-indentation instrument.The influences of the thin film preparation parameters,such as substrate temperature,sputtering power and substrate bias,were discussed.The results show that the titanium nitride films are polycrystalline.And the morphology,structure and performance of the films are complexly influenced by the sputtering power,substrate negative bias voltage and substrate temperature.